Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-225643 BS 3016:1989

BS 3016:1989

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Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-225643 BS 3016:19891 Scope This Technical Report describes a method for determining ion sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X ray photoelectron spectroscopy (XPS) where the specimen is ion sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. This Technical Report is applicable only to a laterally homogeneous bulk or single layered material where the ion sputtering rate is determined from the sputtered